2) Compound Semiconductors
Group III-V : GaAs, GaP, InSb, InP, GaN
II-VI : HgTe, CdSe, ZnS, CdTe ...
‣ GaAs, InP ´Â ÁÖ·Î MMIC³ª LASER¿¡ À¯¿ëÇÏ´Ù.
Âü°í) ()
∙GaAs
∎ Gunn effect (negative resistance)
°íÀü°è¸¦ °¡Çϸé ,
¡Å À̹ǷΠ°¡ Áõ°¡ÇÏ°í, ÀÌ °¨¼ÒÇÏ¿©µµ °¡ ¸Å¿ì ÀÛÀ¸¹Ç·Î ¹«½Ã!
∙Gunn effectÀÇ Á¶°Ç :
i) mass of lower valley < mass of higher valley
mobility of lower valley > mobility of higher valley ()
ii) > energy difference between two conduction valley
otherwise, gunn effect ÀÌÀü¿¡ avalanche ¹ß»ý
∎ Double barrier structure
∎ Esaki Diode
∙GaP
・direct conduction valley (2.88eV) ¡æ used as a LASER material combined with GaAs
・indirect conduction valley (2.1eV) ¡æ LED by N doping
* recombination center vs. trapping
:È®·ü¿¡ ÀÖ¾î¼ C・B·Î ´Ù½Ã µ¹¾Æ°¥ È®·üÀÌ Å©¸é
trapping, V・¡¦(»ý·«)
¨è Energy gap linearly changed.
¨é Inverse mass band parameters linearly changed.
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